[refactor] 整理注释
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+3
-5
@@ -4,14 +4,12 @@
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#include <memory/heap.h>
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#include <serial.h>
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// Per-glyph scratch — kept static to avoid stack pressure for big Chinese glyphs
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// 逐字形临时缓冲区 — 静态分配以避免大中文字形的栈压力
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static ttf_outline_t s_outline;
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static ttf_seg_t s_segs[4096];
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static SUINT8 s_coverage[256 * 256];
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// Render one glyph bitmap at screen (px, py) where py is the glyph TOP
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// (already converted from baseline). (px, py) may be negative — caller
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// must have clipped into the visible region.
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// 在屏幕 (px, py) 处渲染单个字形位图,py 为字形顶部(已从基线转换)
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static void blit_glyph(SSINT32 px, SSINT32 py, SUINT32 w, SUINT32 h,
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const SUINT8* coverage, SUINT32 N,
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EFI_GRAPHICS_OUTPUT_BLT_PIXEL color)
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@@ -31,7 +29,7 @@ static void blit_glyph(SSINT32 px, SSINT32 py, SUINT32 w, SUINT32 h,
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}
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}
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// Render a single codepoint at (x, y) = baseline. Returns advance (26.6).
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// 在基线 (x, y) 处渲染单个码点,返回进宽(26.6 定点数)
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static f26_6 render_codepoint(ttf_face_t* face, SSINT32 cp,
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SSINT32 x, SSINT32 y, SUINT32 pixel_size,
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EFI_GRAPHICS_OUTPUT_BLT_PIXEL color)
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